MASK, LITHOGRAPHING APPARATUS, METHOD OF MANUFACTURING MASK AND LITHOGRAPHING METHOD BASED ON MASK
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United States of America
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Issued Date -
Dec 5, 2024
app pub date -
Oct 19, 2022
filing date -
Oct 19, 2022
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Abstract
A mask, a lithographing apparatus, a method of manufacturing a mask and a lithographing method based on a mask. The mask includes: a substrate (110) configured to be transmissive to an exposure beam (920) for lithography, wherein the exposure beam (920) is in a first frequency band; and a photochromic layer (120) provided on one side of the substrate (110) and comprising a photochromic material, the photochromic layer being configured to generate a corresponding mask pattern under illumination of a modulation beam (930) with a spatial structure, wherein the photochromic material is in a non-light-transmitting state or a light-transmitting state to the exposure beam based on whether the photochromic material is illuminated by modulation light in the modulation beam (930), and the modulation beam (930) is in a second frequency band separated from the first frequency band.
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