EXHAUST DEVICE
Number of patents in Portfolio can not be more than 2000
United States of America
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Issued Date -
Nov 28, 2024
app pub date -
Jan 15, 2024
filing date -
Jan 15, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
An apparatus is provided. The apparatus includes a wafer storage device having an inlet through which a gas flows into a wafer storage chamber of the wafer storage device. A first portion of the gas exits the wafer storage chamber of the wafer storage device through an outlet of the wafer storage device. A second portion of the gas exits the wafer storage chamber of the wafer storage device through one or more discontinuities of the wafer storage device to a space external to the wafer storage device. The apparatus includes an exhaust device arranged relative to the wafer storage device to conduct a measure of the second portion of the gas away from the space.
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