METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MATERIAL
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United States of America
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Issued Date -
Nov 28, 2024
app pub date -
Jul 30, 2024
filing date -
Jul 30, 2024
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Abstract
An extreme ultraviolet mask includes a substrate, a reflective multilayer stack over the substrate, a capping layer over the reflective multilayer stack, a patterned absorber layer over a first portion of the capping layer, and a magnetic layer over a second portion of the capping layer around the first portion.
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