METROLOGY SYSTEM CONFIGURED TO ILLUMINATE AND MEASURE APERTURES OF WORKPIECES
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United States of America
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Issued Date -
Nov 28, 2024
app pub date -
May 25, 2023
filing date -
May 25, 2023
priority date (Note) -
Published
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Abstract
A metrology system includes front and back vision components portions, and is configured to have a workpiece positioned between the two portions. The back vision components portion includes a light source and a diffuser. The front vision components portion includes a variable focal length lens, an objective lens and a camera. The metrology system includes a movement mechanism portion configured to align relative positions between the front and back vision components portions and an aperture defined through the workpiece such that at least a portion of the light from the light source that passes through the diffuser passes through the aperture for providing the illumination for imaging the aperture. The camera acquires an image stack of images of the aperture at different focus positions. Based on an analysis of the image stack, measurements related to workpiece features of the aperture (e.g., including a distance between workpiece features) can be determined.

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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
MITUTOYO CORPORATION | 20-1 SAKADO 1-CHOME TAKATSU-KU KAWASAKI KANAGAWA 213-8533 |
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Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
GLADNICK, Paul Gerard | Seattle, US | 25 | 284 |
HAMNER, Christopher Richard | Kirkland, US | 12 | 37 |
NAGORNYKH, Pavel Ivanovich | Kirkland, US | 3 | 0 |
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