METHOD FOR FORMING CARBON-CONTAINING FILM, AND METHOD FOR FORMING HARD MASK USING THE CARBON-CONTAINING FILM
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United States of America
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Nov 28, 2024
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May 23, 2024
filing date -
May 23, 2024
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Abstract
A method for forming a carbon-containing film includes: preparing a substrate on which a metal-containing film is formed; performing a modification process of modifying a surface of the metal-containing film by supplying a silicon-containing gas to the substrate and by exposing the substrate to the silicon-containing gas during a first period of time; and forming the carbon-containing film having a film stress of 1 GPa or more on the modified surface of the substrate by exposing the substrate subjected to the modification process to plasma of a processing gas including a carbon-containing gas.
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