SUBSTRATE PROCESSING SYSTEM, LOAD DEVICE AND METHOD

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240387213A1
SERIAL NO

18789570

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Abstract

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A system includes at least one sensor and at least one controller. The at least one sensor is configured to generate a first weight signal corresponding to a first weight of a first lot of substrates, and a second weight signal corresponding to a second weight of a second lot of substrates. The at least one controller is coupled to the at least one sensor to receive the first weight signal and the second weight signal. The at least one controller is configured to, based on a weight difference between the first weight and the second weight, control a processing apparatus to rotate the first lot of substrates and the second lot of substrates simultaneously.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78
TSMC CHINA COMPANY LIMITED4000 WEN XIANG ROAD SONGJIANG SHANGHAI

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
LI, Chuang Hsinchu, TW 62 1329
ZHU, Honghua Hsinchu, TW 2 0

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