CANTILEVER WITH ETCH CHAMBER FLOW DESIGN

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240387147A1
SERIAL NO

18785878

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A cantilever for gas flow direction control configured to support an electrode housing bowl in an associated etch process chamber. The cantilever may have a cross-section that is circular, elliptical, or airfoil shaped. The shape of the cantilever induces the flow of gas and etch products within the chamber around the cantilever, reducing turbulence around the edge of a wafer.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chien-Liang New Taipei City, TW 87 825
Chen, Shih-tsung New Taipei City, TW 20 44
Chen, Wei-Da Hsinchu County, TW 6 7
Cheng, Yu-Ning Hsinchu, TW 3 0
Lee, Yung-Yao Hsinchu County, TW 73 134
Wang, Chien-Yu Hsinchu, TW 13 13

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation