RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240385511A1
SERIAL NO

18787928

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Abstract

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A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween that includes a reticle, and a layer of electrostatic discharge material disposed on the first surface, wherein the electrostatic discharge material reduces electrostatic charges on the reticle.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
LIAO, Chi-Hung Sanchong City, TW 140 223
SHIH, Po-Ming Hsinchu, TW 16 4

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