ONSITE CLEANING SYSTEM AND METHOD

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240383013A1
SERIAL NO

18788648

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A cleaning device for cleaning particles from a tool includes a nozzle structure having a spray opening to spray a cleaning liquid in a first direction to the tool, a cleaning pad disposed around the nozzle structure, and a support disposed around the cleaning pad. The cleaning pad exposes the spray opening and includes a front surface facing in the first direction to clean the tool. The support includes multiple gas openings to blow a pressurized gas in the first direction to the tool, and multiple vacuum openings to suck residual gas, liquid and particles around the tool. An air wall around the tool is thus generated by a combination of operations performed by the multiple gas openings and the multiple vacuum openings to reduce or prevent contamination that might be caused by the cleaning device in the chamber.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN ROAD 6 HSINCHU SCIENCE PARK HSINCHU 300

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Li-Jui Hsinchu City, TW 306 606
KUO, Chueh-Chi Kaohsiung City, TW 25 8
LIU, Yen-Hao Hsinchu, TW 7 1
TSAI, Sung-Han Taichung City, TW 3 26

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