CLEANING APPARATUS, SEMICONDUCTOR FABRICATION SYSTEM INCLUDING THE SAME, AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME
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United States of America
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Issued Date -
Nov 21, 2024
app pub date -
Oct 27, 2023
filing date -
Oct 27, 2023
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Abstract
Disclosed are cleaning apparatuses, semiconductor fabrication systems, and semiconductor fabrication methods. The cleaning apparatus comprises a housing that provides an inner space and a cleaning unit combined with the housing. The housing includes a slit that is upwardly recessed from a bottom surface of the housing and is connected to the inner space and a plurality of placement holes that upwardly extend from the bottom surface of the housing. The cleaning unit includes an intake device in the inner space and an intake pipe one end of which is connected to the intake device and another end of which is connected to the slit.
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