PLASMA UNIFORMITY CONTROL SYSTEM USING MULTI-PULSING AND CONTROL METHOD THEREOF
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United States of America
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Issued Date -
Nov 14, 2024
app pub date -
Jul 25, 2022
filing date -
Jul 25, 2022
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Abstract
A system for controlling plasma uniformity according to an embodiment includes a plasma generator configured to generate plasma by applying pulsed power to a plasma source gas, an ion supply unit connected to the plasma generator and configured to receive and accommodate the plasma generated by the plasma generator, a plurality of segmented electrodes positioned inside or below the ion supply unit and configured to be electrically isolated from each other and individually biased at voltages, and a controller configured to control the amount of supply of ions moving from the ion supply unit to the plurality of segmented electrodes.
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