EUV LITHOGRAPHY APPARATUS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240379259A1
SERIAL NO

18781435

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

An extreme ultra violet (EUV) light source apparatus includes an excitation laser inlet port configured to receive an excitation laser, and a first mirror configured to reflect the excitation laser that passes through a zone of excitation. A metal droplet is irradiated by the excitation laser.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Li-Jui Hsinchu City, TW 306 606
CHIEN, Shang-Chieh New Taipei City, TW 193 696
LIU, Heng-Hsin New Taipei City, TW 158 281
TSAI, Cheng Hung Hsinchu, TW 22 109
YU, Sheng-Kang Hsinchu City, TW 61 41

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation