MASK AND METHOD OF FORMING THE SAME
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United States of America
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Issued Date -
Nov 14, 2024
app pub date -
Jul 22, 2024
filing date -
Jul 22, 2024
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Abstract
A mask includes a reflective layer, an absorption layer, a buffer layer and an absorption part. The absorption layer is disposed over the reflective layer. The buffer layer is disposed between the reflective layer and the absorption layer. The absorption part is disposed in the reflective layer, the buffer layer and the absorption layer.
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