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• 15 United States
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• 8 Japan
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Patent Owner(s)

Patent Owner	Address
HOYA CORPORATION	SHINJUKU-KU TOKYO 160-8347

International Classification(s)

• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
IKEBE, Yohei	Tokyo, JP	39	215
# of filed Patents : 39 Total Citations : 215
UMEZAWA, Teiichiro	Tokyo, JP	40	2277
# of filed Patents : 40 Total Citations : 2277

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Full Text

US Patent Application No: 2024/0377,719

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

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Abstract

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Provided is a substrate with a multilayer reflective film comprising a multilayer reflective film having a shallow effective reflective surface and capable of suppressing a phenomenon that atoms to be a material are diffused between a low refractive index layer and a high refractive index layer.

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Description

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