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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
MITSUBISHI GAS CHEMICAL COMPANY INC	TOKYO 100-8324

International Classification(s)

• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
ECHIGO, Masatoshi	Tokyo, JP	137	625
HOSHINO, Ryosuke	Niigata, JP	7	4
KATAGIRI, Masayuki	Niigata, JP	106	1995
OKADA, Takumi	Niigata, JP	20	91
SATO, Hideyuki	Niigata, JP	124	2447
SUZUKI, Shu	Kanagawa, JP	10	5

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
3.5 Year Payment	$1600.00	$800.00	$400.00	May 7, 2028
7.5 Year Payment	$3600.00	$1800.00	$900.00	May 7, 2032
11.5 Year Payment	$7400.00	$3700.00	$1850.00	May 7, 2036

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 3.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2024/0369,925

RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAID COMPOSITION

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