RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME
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United States of America
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Nov 7, 2024
app pub date -
Jul 25, 2022
filing date -
Jul 25, 2022
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Abstract
A resist composition includes: (A) a resin; and (B) a solvent containing: (B1) a compound represented by the following general formula (b-1), wherein the content of the active component is 45% by mass or less based on the total amount of the resist composition:
- wherein R1 is an alkyl group having 1 to 10 carbon atoms.
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