RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240369921A1
SERIAL NO

18776559

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Abstract

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A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween to include a reticle, and a layer of elastomer or gelatinous material disposed on at least one of the first surface and the second surface, wherein the layer of elastomer or gelatinous material is disposed between the base and the cover and contacts either the base or the cover.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HSU, Pei-Cheng Taipei, TW 111 530
LEE, Hsin-Chang Zhubei City, TW 203 1090
LIEN, Ta-Cheng Cyonglin Township, TW 104 198

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