PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD
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United States of America
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Nov 7, 2024
app pub date -
Mar 9, 2022
filing date -
Mar 9, 2022
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Abstract
A patterning device for a lithographic apparatus arranged to project a pattern from the patterning device onto a substrate, the patterning device comprising: an imaging area having opposing first sides extending parallel to a scanning direction of the lithographic apparatus and opposing second sides extending perpendicularly to the scanning direction, and at least one sensing mark located adjacent to at least one second side of the imaging area; wherein the at least one sensing mark is located a predetermined distance in the scanning direction away from the at least one second side of the imaging area and extends a width in the scanning direction such that the at least one sensing mark, when projected onto the substrate, fits within a scribe line on the substrate.
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