METHOD FOR CONTINUOUS EPITAXY OF CARBON FILM
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United States of America
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Nov 7, 2024
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Nov 1, 2022
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Nov 1, 2022
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Abstract
A method for continuous epitaxy of a carbon film, including the following steps: Si, providing a foil, wherein the foil is selected from a nickel foil or a copper-nickel alloy foil and has a first surface and a second surface; and S2, using the foil as a substrate and placing it on a solid carbon source, wherein the first surface of the foil is positioned close to the solid carbon source, while the second surface of the foil is positioned away from the solid carbon source, and then heating the foil and the solid carbon source, so that a carbon film is formed by continuous epitaxy on the second surface of the foil.
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