DRYING APPARATUS AND METHOD BASED ON SUPERCRITICAL FLUID

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20240363370A1
SERIAL NO

18682639

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A drying apparatus is based on supercritical fluid. The drying apparatus includes: an upper cover; a base, arranged below the upper cover and the base and the upper cover; a substrate tray, arranged on the base; a first fluid supply tube, arranged on the top wall of the upper cover; a fluid disturbance plate, arranged below the first fluid supply tube; a second fluid supply tube, arranged on a first side wall of the upper cover; and a fluid discharge tube, arranged on a second side wall of the upper cover. The inner space of the closed chamber can be minimized by using the drying apparatus, thereby saving the usage amount of the supercritical fluid, and reducing the usage costs.

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Patent Owner(s)

Patent OwnerAddress
ACM RESEARCH (SHANGHAI) INCBUILDING 4 NO 1690 CAI LUN ROAD CHINA (SHANGHAI) PILOT FREE TRADE ZONE PUDONG NEW AREA SHANGHAI 201203 201203

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Fuping Shanghai, CN 45 43
Chu, Zhenming Shanghai, CN 5 1
He, Bin Beijing, CN 212 1964
Jia, Shena Shanghai, CN 19 20
Li, Bin Shanghai, CN 1200 10531
Sun, Yingnan Shanghai, CN 2 2
Tao, Xiaofeng Shanghai, CN 78 318
Wang, Deyun Shanghai, CN 8 56
Wang, Hui Shanghai, CN 1115 8921
Wang, Jian Shanghai, CN 1906 17240
Wang, Jun Shanghai, CN 2215 18848
Zhang, Xiaoyan Shanghai, CN 147 1153
Zhao, Xin Shanghai, CN 1071 7724

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