THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES USING SAID THINNER COMPOSITION

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United States of America

APP PUB NO 20240361693A1
SERIAL NO

18580370

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Abstract

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A thinner composition includes: (B) a solvent containing: (B1) a compound represented by the following general formula (b-1): wherein R1 is an alkyl group having 1 to 10 carbon atoms. A method for manufacturing a semiconductor device includes applying the thinner composition to a substrate, before applying a photoresist film material or a photoresist underlayer film material to the substrate.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI GAS CHEMICAL COMPANY INC5-2 MARUNOUCHI 2-CHOME CHIYODA-KU TOKYO 1008324 ?1008324

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ECHIGO, Masatoshi Tokyo, JP 137 625
HOSHINO, Ryosuke Niigata, JP 7 4
KATAGIRI, Masayuki Niigata, JP 106 1995
OKADA, Takumi Niigata, JP 20 91
SATO, Hideyuki Niigata, JP 124 2447
SUZUKI, Shu Kanagawa, JP 10 5

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