MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE
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United States of America Patent
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Oct 24, 2024
app pub date -
Aug 17, 2022
filing date -
Aug 17, 2022
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Abstract
The disclosure is directed at a multi-layer, high-aspect ratio X-ray grating apparatus and method of fabrication. In one embodiment, the disclosure may include a self-alignment methodology, or process, combined with a multiple layer structure fabrication. The grating may include a substrate with a seed layer on top. The grating further includes at least one patterned non-X-ray absorbing layer and at least one X-ray absorbing layer atop the seed layer.
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