LOW-TEMPERATURE PLASMA CONTROL SYSTEM
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United States of America Patent
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Issued Date -
Oct 17, 2024
app pub date -
Jun 13, 2024
filing date -
Jun 13, 2024
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Abstract
A plasma system comprising a low temperature plasma source incident on a material sample and a plurality of sensors that measure a plurality of different characteristics of the plasma. The plasma system further comprising a feedback control system that receives measurements from the plurality of sensors and adjusts inputs to the low temperature plasma source to control one or more of physical, electrical, electromagnetic, chemical, or thermal characteristics of a plasma generated, at a sub-second rate.
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