METHOD FOR MANUFACTURING DRIVE CIRCUIT, DRIVE CIRCUIT AND PHOTOMASK
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United States of America Patent
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Issued Date -
Oct 17, 2024
app pub date -
Dec 30, 2021
filing date -
Dec 30, 2021
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Abstract
The present application disclosed a method for manufacturing a drive circuit, a drive circuit and a photomask, the method covers a photomask (100) on the photoresist layer and performing exposing; the photomask (100) includes pixel control circuit patterns (101), and the pixel control circuit patterns (101) are provided with a plurality of interruptions (102), and a length of the interruption (102) between two adjacent pixel control circuit patterns (101) is a preset distance, to release static electricity generated in the pixel control circuit pattern (101) during exposing; the electrostatic charges on the pixel control circuit patterns (101) can be effectively derived, and the accumulation of electrostatic charges on the pixel control circuit patterns (101) can be avoided, and the probability of electrostatic discharge can be reduced, thereby reducing the risk of damaging to the components used for exposing, and can ensure the integrity of the formed pixel control circuit, so that the drive circuit can operate normally.
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