PHOTOMASK STRUCTURE
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United States of America Patent
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Issued Date -
Oct 17, 2024
app pub date -
Apr 27, 2023
filing date -
Apr 27, 2023
priority date (Note) -
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status (Latency Note)
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Abstract
A photomask structure including a layout pattern, a first L-type assist pattern, and a second L-type assist pattern is provided. An end portion of the layout pattern includes a first edge, a second edge, and a third edge. The second edge is connected to one end of the first edge, and the third edge is connected to another end of the first edge. The first L-type assist pattern is located between the second L-type assist pattern and the first edge. The layout pattern, the first L-type assist pattern, and the second L-type assist pattern are separated from each other. The first L-type assist pattern surrounds the first edge and the second edge. The second L-type assist pattern surrounds the first edge and the third edge.
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Cited Art Landscape
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