AN ATOMIC LAYER DEPOSITION REACTION CHAMBER AND AN ATOMIC LAYER DEPOSITION REACTOR
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United States of America Patent
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Oct 17, 2024
app pub date -
Aug 12, 2022
filing date -
Aug 12, 2022
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Abstract
An atomic layer deposition reaction chamber and a reactor. The reaction chamber includes a first end, a second end, and a longitudinal central axis (X) between the first and second ends and a length (L) in the direction of the longitudinal central axis (X), and a first side wall and a second side wall defining width (W) of the reaction chamber, and a width central axis (Y) extending perpendicularly to the longitudinal central axis (X). The reaction chamber has along the longitudinal central axis (X) an increasing width (W) from the first end towards the width central axis (Y) and a decreasing width (W) from the width central axis (Y) towards the second end.
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