MASK AND MANUFACTURING METHOD THEREOF
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United States of America Patent
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Issued Date -
Oct 17, 2024
app pub date -
Oct 25, 2023
filing date -
Oct 25, 2023
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Abstract
A mask includes a first surface and a second surface opposite to the first surface, and has a total etching area and clearance areas. The mask has vias in the total etching area, and each via communicates the first surface with the second surface. The clearance areas are arranged in the total etching area, and the vias surround each clearance area. Each clearance area further has a through hole therein communicating the first surface with the second surface. Each clearance area is in a shape of a circle or a polygon. When each interior angle of the polygon is less than 120 degrees, the clearance area further comprises a first clearance region and a second clearance region surrounded by the first clearance region, and the mask has a plurality of etched grooves in the first clearance region. The disclosure further provides a manufacturing method of a mask.
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