FACILIATING DESIGNING OF GARMENT BY DUPLICATING PATTERN PIECE IN THREE-DIMENSIONAL SPACE

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United States of America Patent

APP PUB NO 20240341388A1
SERIAL NO

18733155

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Abstract

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The following disclosure relates to a pattern creation simulation method. The pattern creation simulation method may provide a user interface including a first area that controls a plurality of functions for creating or editing a design of a design product in a three-dimensional (3D) virtual space and a second area in which a plurality of interfaces are switched in response to the plurality of functions.

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Patent Owner(s)

Patent OwnerAddress
CLO VIRTUAL FASHION INC43F 42F 152 TEHERAN-RO GANGNAM-GU SEOUL 06236 06236

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HAM, Hyung Gi Seoul, KR 6 0
JEONG, Tae Wan Seoul, KR 4 117
MA, Jae Hwan Seoul, KR 4 0

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