THIN-FILM CRYSTALLINE STRUCTURE WITH SURFACES HAVING SELECTED PLANE ORIENTATIONS
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United States of America Patent
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Issued Date -
Oct 10, 2024
app pub date -
Jun 21, 2024
filing date -
Nov 20, 2017
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status (Latency Note)
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Abstract
A method of forming a thin film structure involves performing one or more repetitions to form a template on a wafer. The repetitions include: depositing a layer of a template material to a thickness; and ion beam milling the layer of the template material to remove thickness less than the first thickness. The ion beam milling may be performed at a two different angles during two different repetitions. At least one of the angles is a channeling angle defined relative to a crystalline microstructure of the template material. After the repetitions, additional material may be deposited on the template to form a final structure. The additional material has a same crystalline microstructure as the template material.
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International Classification(s)
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B82Y:SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; ....
- B81C:PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE M....
- B82B:NANO-STRUCTURES; MANUFACTURE OR TREATMENT THEREOF
- G11B:INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BET....
- H01F:MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF M....
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