SYSTEM AND METHOD FOR FAST MICROSCOPY
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United States of America Patent
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Issued Date -
Oct 10, 2024
app pub date -
Apr 4, 2024
filing date -
Apr 7, 2023
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Abstract
A time resolved reflectivity metrology device images structures underlying layers using a pulsed pump beam and pulsed probe beam with at least one time delay between the pulses. One or both beams are modulated. A camera with a multi-pixel array and independent phase locking for each pixel in the multi-pixel array receives and demodulates the reflected probe beam to generate images. The camera may record a change in reflectivity or surface deformation of the target sample at every pixel as a function of at least one time delay between the pump pulses and the probe pulses, with which at least one property of the target sample may be characterized.
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