SYSTEM AND METHOD FOR DIAGNOSING DESIGN RULE CHECK VIOLATIONS
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United States of America Patent
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Issued Date -
Oct 3, 2024
app pub date -
Jun 7, 2024
filing date -
Nov 24, 2020
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Abstract
A system and method for fixing DRC violations includes receiving a layout pattern having a design rule check (DRC) violation therein, determining that the layout pattern is an inlier based upon a comparison of the layout pattern with a plurality of previously analyzed layout patterns. The comparison may be performed by an anomaly detection algorithm. The system and method may also include selecting a recipe from a pool of recipes previously applied to the plurality of previously analyzed layout patterns for fixing the DRC violation in the layout clip upon determining that the layout pattern is an inlier.
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