COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
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United States of America Patent
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Issued Date -
Oct 3, 2024
app pub date -
Mar 12, 2024
filing date -
Mar 29, 2023
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Abstract
Provided is a means for allowing residues remaining on the surface of a polished object to be further reduced. Provided is a composition for surface treatment containing components (A) to (C) below and having pH of more than 7.0: the component (A): a piperazine-based compound represented by a formula (a) below and having two or more amino groups having pKa larger than the pH of the composition for surface treatment, the component (B): an anionic polymer, and the component (C): a buffer represented by a formula: A-COO—NH4+ (A is an alkyl group having 1 or more and 10 or less carbon atoms or a phenyl group).
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