INTERPOSER WITH LINES HAVING PORTIONS SEPARATED BY BARRIER LAYERS
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United States of America Patent
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Issued Date -
Sep 26, 2024
app pub date -
Sep 18, 2023
filing date -
Mar 20, 2023
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Abstract
Interposers and methods for making interposers having a substrate having a surface defining a plane; a first portion of a metal line directly or indirectly supported by the substrate; a barrier layer on the first portion of the metal line; a second portion of the metal line on the first barrier layer, wherein the second portion is opposite the first portion across the barrier layer. The method includes etching a line pattern in a first portion of a metal layer through a first photoresist layer to form a first portion of a metal line, depositing a barrier layer on the first portion of the metal line, and etching a line pattern in a second portion of the metal layer through a second photoresist layer to form a second portion of a metal line wherein the second portion is opposite the first portion across the barrier layer.
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