SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Sep 26, 2024
app pub date -
Mar 6, 2024
filing date -
Mar 20, 2023
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
There is provided a technique that includes: a substrate processor configured to process a substrate according to a recipe including at least one step defining a substrate processing condition; an operator configured to receive an editing operation for at least one setting item included in the substrate processing condition; a calculator configured to calculate a control value for a setting value of the at least one setting item in conformity with an edited substrate processing condition obtained by the editing operation; and a controller configured to be capable of controlling a displayer to display time-series data of the control value calculated by the calculator together with information about the at least one step.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully