Optical Lithography System and Method of Using the Same
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United States of America Patent
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Sep 26, 2024
app pub date -
Jun 4, 2024
filing date -
Jul 9, 2021
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Abstract
In an embodiment, an apparatus includes an energy source, a support platform for holding a wafer, an optical path extending from the energy source to the support platform, and a photomask aligned such that a patterned major surface of the photomask is parallel to the force of gravity, where the optical path passes through the photomask, where the patterned major surface of the photomask is perpendicular to a topmost surface of the support platform.
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