EXPOSURE SYSTEM, METHOD OF FORMING ALIGNMENT FILM, METHOD OF MANUFACTURING OPTICAL ELEMENT, AND OPTICAL ELEMENT
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United States of America Patent
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Issued Date -
Sep 26, 2024
app pub date -
May 31, 2024
filing date -
Dec 3, 2021
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Abstract
Provided are an exposure system that simply manufactures an alignment film corresponding to an optical element where a focal length continuously changes, a method of forming an alignment film using the exposure system, a method of manufacturing an optical element using the alignment film, and an optical element. The exposure system includes: a light source; a beam splitter that splits light emitted from the light source; a beam combiner that combines the light split by the beam splitter and includes a first surface allowing transmission of light and a second surface reflecting light; focusing elements that is provided upstream of the beam combiner; and a polarization conversion element, in which one or more of the focusing elements have a focal length continuously changes in a direction orthogonal to an optical axis and away from the optical axis, and a ratio of a maximum value to a minimum value of the focal length is more than 1.1.
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