Importance

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Abstract

There is provided a technique that includes: an inner container accommodating a substrate; an outer container surrounding side wall of the inner container; an inner exhaust port provided at the side wall of the inner container such that the inner exhaust port is provided at position facing arrangement region of the substrate in the inner container; an outer exhaust port provided at the outer container such that the outer exhaust port is provided at position different from the position of the inner exhaust port in circumferential direction of the side wall of the inner container; a first processing gas supply system supplying a first processing gas into the inner container; and an inert gas supply system supplying an inert gas to a space between the inner and outer containers from a gas supply port provided at a position between the inner and outer exhaust ports in the circumferential direction.

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First Claim