PATTERN DESIGN METHOD, TEMPLATE MANUFACTURING METHOD, AND PATTERN DESIGN APPARATUS
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United States of America Patent
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Issued Date -
Sep 26, 2024
app pub date -
Mar 7, 2024
filing date -
Mar 20, 2023
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Abstract
A pattern design method according to an embodiment is a method to design a pattern of a template used for an imprint process. The imprint process serves to form a predetermined pattern by pressing a shot surface of the template against a surface of a processed layer. The method includes setting an outer edge coverage range corresponding to an outer edge region located a predetermined distance inside an edge of the shot surface of the template. The outer edge coverage range is set to be different from an inner coverage range corresponding to an inner region inside the outer edge region. The method includes designing a pattern in the outer edge region to have a coverage falling within the outer edge coverage range. The method includes designing a pattern in the inner region to have a coverage falling within the inner coverage range.
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