SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE USING THE SAME

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United States of America Patent

APP PUB NO 20240316571A1
SERIAL NO

18517852

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Abstract

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A substrate treating apparatus includes a chamber defining a chamber cavity, a substrate carrier movable in a first direction inside of the chamber cavity, and a filter disposed inside the chamber cavity, defining an opening through which the substrate carrier passes, and including a magnet filter disposed in the opening and being rotatable.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTD1 SAMSUNG-RO GIHEUNG-GU YONGIN-SI GYEONGGI-DO 17113

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KANG, EUGENE Yongin-si, KR 11 31
PARK, YOUNG-HUN Yongin-si, KR 12 102
SEO, CHANGWOOK Yongin-si, KR 1 0
YUN, SEUNG GEUN Yongin-si, KR 1 0

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