SEMICONDUCTOR DEVICE
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United States of America Patent
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Issued Date -
Sep 19, 2024
app pub date -
Mar 1, 2024
filing date -
Mar 13, 2023
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status (Latency Note)
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Abstract
A semiconductor device includes a first oxide semiconductor layer extending in a first direction, a first wiring extending in a second direction that intersects the first direction and surrounding the first oxide semiconductor layer, a first insulating film provided between the first wiring and the first oxide semiconductor layer, a first conductor provided on the first oxide semiconductor layer, a second wiring provided on the first conductor and extending in a third direction that intersects each of the first direction and the second direction, a first insulating layer in contact with a side surface of the second wiring, and a second insulating layer provided on the first insulating layer and having oxygen permeability lower than oxygen permeability of the first insulating layer.
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