DIAGNOSTIC APPARATUS AND DIAGNOSTIC METHOD, AND SEMICONDUCTOR MANUFACTURING APPARATUS SYSTEM AND SEMICONDUCTOR APPARATUS MANUFACTURING SYSTEM
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United States of America Patent
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Issued Date -
Sep 19, 2024
app pub date -
Feb 24, 2022
filing date -
Feb 24, 2022
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Abstract
An apparatus diagnostic apparatus is configured such that: a time range during which a first time-series signal obtained from a sensor is masked is set; data in which a first time-series signal corresponding to the masked time range is masked is created; a standardized model is created by using the data obtained by masking the first time-series signal; a standardization process is performed on the data in which the first time-series signal is masked by using the standardized model; a normal model is created by using a plurality of pieces of data; masking of a second time-series signal in a masked time range is performed on a second time-series signal obtained from a sensor; a standardization process is performed by using the standardized model; and an anomalous value is calculated from a signal obtained by the standardization process of the second time-series signal.
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