RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ACID CATALYST-SUPPORTING POLYMER
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United States of America Patent
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Issued Date -
Sep 19, 2024
app pub date -
Mar 14, 2022
filing date -
Mar 15, 2021
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Abstract
The present invention provides a composition for forming a resist underlayer film with which a desired resist pattern can be formed, a method for manufacturing a resist pattern wherein said resist underlayer film-forming composition is used, and a method for manufacturing a semiconductor device. The resist underlayer film-forming composition includes a polymer that supports an acid compound at a terminal end thereof, and a solvent. The acid compound may be ionically bonded to a base that is present at the terminal end of the polymer. Said terminal end may be represented by formula (1) (in the formula, A1 represents an acid compound, B represents a basic structure, and * represents a section of bonding with a polymer moiety).
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