METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK
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United States of America Patent
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Sep 19, 2024
app pub date -
May 17, 2024
filing date -
Nov 23, 2021
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Abstract
The present invention relates to a method and an apparatus for calibrating an operation on a mask. A method for producing correction marks on an object for lithography, in particular for calibrating an operation, using a particle beam includes: (a.) producing a first group of correction marks; and (b.) producing a second group of correction marks; (c.) wherein the separations of the correction marks within the first and within the second group are smaller than the separations between correction marks from the first group and correction marks from the second group.
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