SYSTEMS AND METHODS FOR MONITORING OF A CONTROLLED ENVIRONMENT IN A SUBSTRATE PROCESSING SYSTEM
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United States of America Patent
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Issued Date -
Sep 12, 2024
app pub date -
Mar 5, 2024
filing date -
Mar 9, 2023
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Abstract
Aspects of the disclosure relate to a substrate processing system having a controlled environment comprising one or more FOUPs configured to hold one or more substrates, a substrate processing chamber configured to process the substrate(s), a substrate handling and transporting system configured to receive the FOUP(s) and transfer the substrate(s) to and from the substrate processing chamber, an environmental sensor configured to measure one or more environmental parameters of the substrate handling and transporting system, and a controller communicatively coupled to the environmental sensor configured to track one or more positions of the substrate(s) within the substrate handling and transporting system, determine one or more environmental parameters of the substrate handling and transporting system, determine whether the environmental parameter(s) are within threshold limits at the one or more position of the substrate(s), and indicate an alert if the environmental parameter(s) are determined to not be within the threshold limits.
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