METAL ORGANONITRILE PRECURSORS FOR THIN FILM DEPOSITION
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United States of America Patent
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Sep 12, 2024
app pub date -
May 9, 2023
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Mar 10, 2023
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Abstract
Metal complexes with nitrile ligands of the type MO2X2L2, where M is molybdenum or tungsten, X is a halogen, each L is independently an organonitrile ligand with the general formula NCR, where each R is independently a C2-C18 group. Metal complexes with dinitrile bidentate ligands of the type MO2X2L′, where L′ is a dintrile ligand, and dinitrile bridging ligands of the type (MO2X2)2L′, where L′ is a dinitrile bridging ligand connecting the two metal atoms. Methods of making and using the metal complexes are described.
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