SYSTEMS AND METHODS FOR FOCUS CONTROL IN X-RAYS
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United States of America Patent
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Sep 5, 2024
app pub date -
Apr 29, 2024
filing date -
Apr 24, 2019
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Abstract
A method may include obtaining a feedback or a reference value of a tube voltage applied to a radiation source of a radiation device for generating radiation rays. The method may also include determining, based on the feedback or the reference value of the tube voltage, a specific value of a focusing parameter associated with a focusing device of the radiation device. The method may further include causing the focusing device to shape a focus of the radiation rays according to the determined value of the focusing parameter. The focus of the radiation rays may satisfy an operational constraint under the specific value of the focusing parameter.
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