HYDROGEN IMPURITY TESTING SYSTEM AND HYDROGEN IMPURITY TESTING METHOD

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United States of America Patent

APP PUB NO 20240297316A1
SERIAL NO

18584812

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Abstract

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The highly reliable hydrogen impurity testing system includes a sensor unit installed in an atmosphere with highly concentrated hydrogen containing toxic impurities, a heater unit capable of heating the sensor unit, and a system controller controlling the sensor unit and the heater unit. The heater unit includes a semiconductor substrate, an impurity layer of a first conductive type, a metal oxide layer, and a metal electrode layer capable of adsorbing toxic impurities being present on the surface of the metal oxide layer. The system controller detects the concentration of the toxic impurities by measuring the change in work function of the metal electrode layer according to the type and concentration of the toxic impurities, and performs a refreshing operation of desorbing the toxic impurities adsorbed on the metal electrode layer by heating the metal electrode layer with the heater unit based on the result of detection.

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Patent Owner(s)

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HITACHI HIGH-TECH ANALYSIS CORPORATION17-1 TORANOMON 1-CHOME MINATO-KU TOKYO 105-6411

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  • 2024 Application Filing Year
  • H01M Class
  • 6354 Applications Filed
  • 230 Patents Issued To-Date
  • 3.62 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
MATOBA, Yoshiki Tokyo, JP 35 226
RYUZAKI, Daisuke Tokyo, JP 53 347
SASAGO, Yoshitaka Tokyo, JP 86 1245
SUZUKI, Naoki Tokyo, JP 126 1643
TAKAHARA, Toshiyuki Tokyo, JP 24 141

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges579113201 - 1002505007501000125015001750200022502500275030003250350037504000425045004750500052505500575060006250

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