CLEANING SOLUTION AND METHOD OF CLEANING WAFER

United States of America Patent

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Sep 5, 2024
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Apr 12, 2024
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Apr 15, 2019

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Abstract

A cleaning solution includes a solvent having Hansen solubility parameters: 25>δ_d>13, 25>δ_p>3, 30>δ_h>4; an acid having an acid dissociation constant pKa: −11pKa>9.5; and a surfactant. The surfactant is an ionic or non-ionic surfactant, selected from

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TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD	NO 8 LI-HSIN RD VI HSINCHU SCIENCE PARK HSINCHU 300

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Inventor Name	Address	# of filed Patents	Total Citations
CHANG, Ching-Yu	Yuansun Village, TW	578	7902
ZI, An-Ren	Hsinchu City, TW	91	210

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CLEANING SOLUTION AND METHOD OF CLEANING WAFER

Number of patents in Portfolio can not be more than 2000

United States of America Patent

18634408

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18634408

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