SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Sep 5, 2024
app pub date -
Feb 20, 2024
filing date -
Mar 2, 2023
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Abstract
A substrate processing apparatus includes a vacuum chamber; a rotary table rotatably provided in the vacuum chamber; and a stage configured to rotate together with the rotary table. The rotary table has an opening provided at a position spaced apart from a rotation center of the rotary table. An inner surface of the opening is continuous with an upper surface and a lower surface of the rotary table. The stage is spaced apart from the inner surface of the opening by a clearance.
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