CLEANING LIQUID FOR REMOVING CERIUM COMPOUND, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER

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United States of America Patent

APP PUB NO 20240294854A1
SERIAL NO

18659733

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Abstract

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A cleaning liquid for removing a cerium compound contains (A) a six-membered ring compound having two or more hydroxy groups, and (B) an inorganic acid compound, and a mass ratio of the component (B) to the component (A) is 0.05 to 0.6. The component (A) may contain at least one selected from the group consisting of catechol, resorcinol, hydroquinone, pyrogallol, and methylcatechol.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATIONCHIYODA-KU TOKYO 100-8251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ABE, Mari Tokyo, JP 17 579
KIYONO, Kenichi Tokyo, JP 6 25
KUSANO, Tomohiro Tokyo, JP 25 452
MINAYOSHI, Kanako Tokyo, JP 1 0
TAKESHITA, Kan Tokyo, JP 4 4

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